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Research Papers

Laser Diagnostics of Plasma in Synthesis of Graphene-Based Materials

[+] Author and Article Information
Alfredo D. Tuesta

Nanoscale Transport Research Group,
School of Mechanical Engineering,
Purdue University,
West Lafayette, IN 47907
e-mail: atuesta@purdue.edu

Aizaz Bhuiyan

Applied Laser Spectroscopy Laboratory,
School of Mechanical Engineering,
Purdue University,
West Lafayette, IN 47907
e-mail: abhuiyan@purdue.edu

Robert P. Lucht

Applied Laser Spectroscopy Laboratory,
School of Mechanical Engineering,
Purdue University,
West Lafayette, IN 47907
e-mail: lucht@purdue.edu

Timothy S. Fisher

Nanoscale Transport Research Group,
School of Mechanical Engineering,
Purdue University,
West Lafayette, IN 47907
e-mail: tsfisher@purdue.edu

1Correspondence author.

Contributed by the Manufacturing Engineering Division of ASME for publication in the JOURNAL OF MICRO- AND NANO-MANUFACTURING. Manuscript received February 20, 2014; final manuscript received April 23, 2014; published online July 8, 2014. Editor: Jian Cao.

J. Micro Nano-Manuf 2(3), 031002 (Jul 08, 2014) (8 pages) Paper No: JMNM-14-1010; doi: 10.1115/1.4027547 History: Received February 20, 2014; Revised April 23, 2014

Rotational temperature profiles of H2 in a microwave plasma chemical vapor deposition (MPCVD) reactor were measured via coherent anti-Stokes Raman scattering (CARS) spectroscopy. The temperature was found to increase with reactor pressure, plasma generator power, and distance from the deposition surface. At 10 Torr, the measured temperature range was approximately 700–1200 K while at 30 Torr it was 1200–2000 K under the conditions studied. The introduction of CH4 and N2 to the plasma increased the rotational temperature consistently. These findings will aid in understanding the function of the chemical composition and reactions in the plasma environment of these reactors which, to date, remains obscure.

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Figures

Grahic Jump Location
Fig. 1

Illustration of plasma bulk over molybdenum puck and plasma sheath boundary region

Grahic Jump Location
Fig. 2

Schematic diagram of CARS beams and energy diagram

Grahic Jump Location
Fig. 3

Population distribution for the rotational energy mode of H2. Intensity alteration in the rotational fine structure is due to nuclear spin statistics.

Grahic Jump Location
Fig. 4

Schematic diagram of the microwave plasma chemical vapor deposition reactor at two stage positions: (a) susceptor stage ready to accept substrate and (b) the susceptor stage raised to 53 mm for the ignition of the plasma

Grahic Jump Location
Fig. 5

Raman spectrum from two positions on the top surface of the copper disk directly exposed to the plasma

Grahic Jump Location
Fig. 6

Raman spectrum from the bottom surface of the copper disk

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Fig. 7

Schematic diagram of the CARS system

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Fig. 8

Theoretical fit to room-temperature spectrum. CARSFT code converges to a temperature of 272 K.

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Fig. 9

Theoretical fit to a H2 spectrum from plasma. CARSFT code converges to a temperature of 1341 K.

Grahic Jump Location
Fig. 10

Intensity of H2 Q(1) line as a function of beam intensity. The Stokes beam energy was 4.8 mJ/pulse.

Grahic Jump Location
Fig. 11

Rotational temperature of H2 at 10 Torr with varying plasma generator powers, with and without CH4 (10 sccm)

Grahic Jump Location
Fig. 12

Rotational temperature of H2 at 30 Torr with varying plasma generator powers, with and without CH4 (10 sccm)

Grahic Jump Location
Fig. 13

H2 rotational temperature distributions at 10 Torr, 400 W with and without CH4 and N2

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