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Research Papers

Electromagnetic Embossing of Optical Microstructures

[+] Author and Article Information
Lasse Langstädtler

Bremen Institute for Mechanical
Engineering (bime),
MAPEX Center for Materials and Processing,
University of Bremen,
Badgasteiner Straße 1,
Bremen 28359, Germany
e-mail: langstaedtler@bime.de

Lars Schönemann

Laboratory for Precision Machining (LFM),
MAPEX Center for Materials and Processing,
University of Bremen,
Badgasteiner Straße 2,
Bremen 28359, Germany

Christian Schenck, Bernd Kuhfuss

Bremen Institute for Mechanical
Engineering (bime),
MAPEX Center for Materials and Processing,
University of Bremen,
Badgasteiner Straße 1,
Bremen 28359, Germany

1Corresponding author.

Contributed by the Manufacturing Engineering Division of ASME for publication in the JOURNAL OF MICRO- AND NANO-MANUFACTURING. Manuscript received July 16, 2015; final manuscript received December 14, 2015; published online February 11, 2016. Assoc. Editor: Gracious Ngaile.

J. Micro Nano-Manuf 4(2), 021001 (Feb 11, 2016) (4 pages) Paper No: JMNM-15-1045; doi: 10.1115/1.4032323 History: Received July 16, 2015; Revised December 14, 2015

Electromagnetic forming (EMF) is a high-speed forming process that is already established in the macroworld. Due to its advantages like high deformation rate and cheaper tools, it is introduced to microforming. In this research, the replication of prismatic optical microstructures is investigated. EN AW-1050A (Al99.5) micrometal sheets with a thickness of 50 μm and 300 μm are electromagnetically micro-embossed. With this technique, it is possible to successfully replicate triangular cross section micro V-grooves of 86.6 μm in width and 24.1 μm in depth with an average surface roughness of Sa = 44 nm. The microstructures of the embossing tool are generated by diamond micro chiseling (DMC), a novel machining process to produce microstructures with discontinuous geometry, like miniature cube corner retro reflectors and V-grooves with well-defined endings.

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References

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Figures

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Fig. 1

DMC: (a) process kinematics and (b) example structures

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Fig. 2

Experimental setup: (a) side view and (b) V-groove geometry

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Fig. 3

Embossing results (EC = 1800 J, dc = 0 mm): (a) s0 = 50 μm, (b) s0 = 300 μm, and (c)profile

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Fig. 4

Profile of embossed microstructure (s0 = 300 μm, EC = 1800 J, dc = 0 mm): (a) contour of sheet and tool and (b) single V-groove

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Fig. 5

Profile of embossing result, dc = 0 mm, s0 = 50 μm + driver, EC = 1800 J

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Fig. 6

Variation of the clearance dc, EC = 1800 J

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Fig. 7

Embossed structure (top view) (a) surface quality of facets, dc = 0.9 mm, s0 = 50 μm + driver and (b) cross-structure

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