Technical Brief

Experiment-Based Quantitative Analysis of Picosecond Pulse-Induced Morphological Changes in Fused Silica

[+] Author and Article Information
Jingwen Yan, Han Wang

School of Mechanical Engineering,
Shanghai Jiao Tong University,
Shanghai 200240, China

Hong Shen

School of Mechanical Engineering,
Shanghai Jiao Tong University,
Shanghai 200240, China;
State Key Laboratory of Mechanical System and Vibration,
Shanghai 200240, China
e-mail: sh_0320@sjtu.edu.cn

1Corresponding author.

Contributed by the Manufacturing Engineering Division of ASME for publication in the JOURNAL OF MICRO-AND NANO-MANUFACTURING. Manuscript received June 14, 2018; final manuscript received August 22, 2018; published online October 10, 2018. Assoc. Editor: Cheryl Xu.

J. Micro Nano-Manuf 6(4), 044501 (Oct 10, 2018) (5 pages) Paper No: JMNM-18-1020; doi: 10.1115/1.4041509 History: Received June 14, 2018; Revised August 22, 2018

Due to its excellent quality, fused silica has been widely used in various industrial applications. The nonlinear absorptive nature of ultrafast laser pulses enables the induction of morphological changes within the bulk transparent materials. In this study, the interior modification of fused silica is induced by a picosecond pulsed laser, and the relationship between processing parameters and the modification geometry is demonstrated. Three different patterns are identified according to the geometric characteristics of the modification. Furthermore, a simple experiment-based model considering the incubation effect is put forward to predict picosecond pulse-induced morphological changes in fused silica.

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Fig. 1

Glass processing by picosecond pulse laser

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Fig. 2

Modified feature (57.1 μJ, 20 mm/s)

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Fig. 3

Evolution of plasma in fused silica

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Fig. 4

The cross section modified feature at different pulse energies (v = 100 mm/s)

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Fig. 5

The length and width of modified feature at different pulse energy (v = 100 mm/s)

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Fig. 6

The cross section modified feature at different scanning velocities (E = 57.1 μJ)

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Fig. 7

The length and width of modified feature at different scanning velocities (E = 57.1 μJ)

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Fig. 8

Three patterns of modified feature in glass

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Fig. 9

Schematic diagram of ωd and ωl

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Fig. 10

Layout of three different patterns for the modification feature



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